Prof. Dr.   J. Kiss                  Research Interest

 Photon, electron and thermal activation of chemical reactions on metal and semiconductor 

 Formation, stability and reactivity of  adsorbed species and intermediates formed in catalytic reactions on metal, oxide and nanoparticles


 Application and development of electron spectroscopic methodes (XPS, UPS, AES, HREELS, LEIS) and reflection absorption spectroscopy (RAIRS) in catalysis and surface chemistry