Publications:

1. M. Erdelyi, Zsolt Bor, Joseph R. Cavallaro, Gabor Szabo, William L. Wilson, Chaitali Sengupta, Michael C. Smayling and Frank K. Tittel: Enhanced Microlithography Using Combined Phase Shifting and Off-axis Illumination, Jpn. J. Appl. Phys. Vol. 34 (1995) pp. L1629-1631, Part 2, No. 12A December 1995.

2. M. Erdelyi, Z. L. Horvath, G. Szabo, Zs. Bor, F. K. Tittel, Joseph R. Cavallaro, Michael C. Smayling: Generation of Diffraction-Free Beams for Applications in Optical Microlithography, J. Vac. Sci. Technol. B 15(2) Mar/Apr 287-292 (1997).

3. Z. L. Horvath, M. Erdelyi, G. Szabo, Zs. Bor, F. K. Tittel and J. R. Cavallaro: Generation of nondiffracting Bessel Beams with Fabry-Perot interferometer, J. Opt. Soc. Am. A, 14(11), pp.: 3009-3013, (1997)

4. M. Erdelyi, Margit Hilbert, and Zsolt Bor: Anomalous Dispersion of Dye Solutions Observed in a Prismatic Cuvette, Am. J. Phys. 66(9), pp.: 791-793, (1998)

5. M. Erdelyi, Zs. Bor, William L. Wilson, Michael C. Smayling and Frank K. Tittel: Simulation of Coherent Multiple Imaging by means of Pupil Plane Filtering in Optical Microlithography, J. Opt. Soc. Am. A 16(8), pp.: 1909-1914 (1999)

6. M. Erdelyi, Zsolt Bor, William L. Wilson, Michael C. Smayling and Frank K. Tittel: Enhanced Optical Microlithography Using a Fabry-Perot Based Spatial Filtering Technique, Applied Optics 39(7), 1121-1129 (2000)

7. Dirk Rehle, Darrin Leleux, M. Erdelyi, Frank Tittel, Matthew Fraser and Stephen Friedfeld: Ambient Formaldehyde Detection with a Laser Spectrometer based on Difference Frequency Generation in PPLN, Applied Physics B 72, 947-952 (2001).

8. D. Richter, M. Erdelyi, R. F. Curl, F. K. Tittel, C. Oppenheimer, H. J. Duffell, and M. Burton, "Fields measurements of volcanic gases using tunable diode laser based mid-infrared and Fourier transform infrared spectrometers", Optics and Lasers in Engineering 37, 171-186 (2002).

9. Zoltán Bozóki, Árpád Mohácsi, Gábor Szabó and Zsolt Bor, Miklós Erdélyi, Weidong Chen and Frank K. Tittel: Near Infrared Diode Laser Based Spectroscopic Detection of Ammonia: A Comparative Study of Photoacoustic and Direct Optical Absorption Methods, Applied Spectroscopy 56(6), 715-719 (2002).

10. Miklós Erdélyi, Dirk Richter and Frank K. Tittel: ¹³CO₂/¹²CO₂ isotopic ratio measurements using a difference-frequency-based sensor operating at 4.35 mm, Applied Physics B, 2002. September

Conference Papers:

1. Zs. Bor, Joseph R. Cavallaro, M. Erdelyi, Motoi Kido, C. Sengupta, Michael C. Smayling, Gabor Szabo, Frank K. Tittel and William L. Wilson: A New Phase Shifting Technique for Deep UV Excimer Laser Based Lithography, Photonics West '95, San Jose, CA (Feb. 4-10, 1995) SPIE Vol. 2380, 195-202 (1995)

2. Miklos Erdelyi, Chaitali Sengupta, Zsolt Bor, Joseph R. Cavallaro, Motoi Kido, Michael C. Smayling, Frank K. Tittel, William L. Wilson, Gabor Szabo: A New Interferometric Phase-Shifting Technique for Sub-half-micron Laser Microlithography, Optical Microlithography VIII, Santa Clara, CA (February 19-24, 1995); SPIE Proc. 2440, 827-837 (1995)

3. F. K. Tittel, M. Erdelyi, C. Sengupta, Zs. Bor, G. Szabo, J. R. Cavallaro, M. C. Smayling and W. L. Wilson: Ultrahigh Resolution Lithography with Excimer Lasers, NATO Workshop on "Gas Lasers-Recent Development and Future Prospects, Moscow, Russia, Kluwer Academic Publishers, 263-272, (1996) (ISBN 0 7923 3988 6) (edited by W. J. Witteman and V. N. Ochkin)

4. Chaitali Sengupta, Miklos Erdelyi, Zsolt Bor, Joseph R. Cavallaro, Michael C. Smayling, Gabor Szabo, Frank K. Tittel, William L. Wilson: An Integrated CAD Framework Linking VLSI Layout Editors and Process Simulators, Optical Microlithography IX, Santa Clara, CA (March 13-15, 1996); SPIE Proc. 2726, 244-252 (1996)

5. Miklos Erdelyi, Zsolt Bor, Gabor Szabo, Joseph R. Cavallaro, Michael C. Smayling, Frank K. Tittel and William L. Wilson: Sub-quarter micron contact hole fabrication using annular illumination, Optical Microlithography IX, Santa Clara, CA (March 10-13, 1996); SPIE Proc. 2726, 88-93 (1996)

6. F. K. Tittel, M. Erdelyi, G. Szabo, Zs. Bor, J. Cavallaro and M. C. Smayling: High Resolution Microlithography Applications of Deep-UV Excimer Lasers, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference GCL/HPL '96, Edinburgh, U.K. (Aug. 26-30, 1996). SPIE Proceedings vol. 3092: 462-466

7. Zsolt Bor, M. Erdelyi, Z. L. Horvath, G. Szabo, F. K. Tittel, J. R. Cavallaro and M. C. Smayling: Generation of Diffraction-Free Beams for Application in Optical Microlithography, Workshop "Holography as Realized" Kecskemet, Hungary, June 3-4, (1996)

8. M. Erdelyi, Z. L. Horvath, Zs. Bor, G. Szabo, J. R. Cavallaro, Michael C. Smayling and F. K. Tittel: Optical microlithography with nearly nondiffracting beams, Optical Microlithography X, Santa Clara, CA (March 9-14, 1997); SPIE Proc. 3051, 959-966, (1997)

9. Z. L. Horváth, M. Erdélyi, G. Szabó, Zs. Bor, F. K. Tittel, and J. R. Cavallaro: Generation of zero order Bessel beams with Fabry-Perot interferometer, International Conference on New Laser Technologies and Applications (Paolo Di Lazzaro Greece 1997) SPIE Proc. Vol.: 3423 pp.: 135-139

10. F. K. Tittel, M. Erdélyi, Z. L. Horváth, A. Kroyan, W. William, M. Smayling, Zs. Bor and G. Szabó, Present and future trends in excimer-laser-based microlithography, Proc. SPIE Vol. 3403, p. 248-253 (1998), International Conference on Atomic and Molecular Pulsed Lasers II, Ed.: Victor F. Tarasenko; Georgy V. Mayer; Gueorgii G. Petrash.

11. M. Erdelyi, Zs. Bor, G. Szabo and F. K. Tittel: Enhanced microlithography using coated objectives and image duplication, Optical Microlithography XI, Santa Clara, CA (February 22-27, 1998); SPIE Proc. 3334 pp.: 579-589 (1998)

12. Zs. Bor, M. Erdelyi, Z. L. Horvath, G. Szabo and F. K. Tittel: Depth of Focus Enhancement with Nearly Nondiffracting Beams, 1997 Korean-Hungarian Seminar on Integrated Circuits and Devices, June 24-26 1997, Budapest

13. Zs. Bor, M. Csete, M. Erdelyi, Zs. Geretovszky, P. Heszler, B. Hopp, Z. Horvath, Z. Kantor, B. Revesz, G. Szabo, T. Szorenyi, and Zs. Toth: Surface structuring by laser-based techniques, Nanotechnology, a dedicated tool for the future, Eds.: I. Mojzes and B. Kovács, ISBN 963-8531657, MIL-ORG. Ltd, NETI, Budapest, 67-105 (1997).

14. M. Erdelyi, A Kroyan, K. Osvay, Zs. Bor, W. L. Wilson, M. C. Smayling and F. K. Tittel: Coherent Multiple Imaging by means of Pupil Plane Filter, Optical Microlithography XII, Santa Clara, CA (February 17-19, 1999); SPIE Proc. 3679 pp.: 762-771 (1999)

15. M. Erdelyi, K. Osvay, Zs. Bor, W. L. Wilson, M. C. Smayling and F. K. Tittel: Enhanced Microlithography using Coherent Multiple Imaging, The International Symposium on Microelectronics Manufacturing Technologies (Lithography for Semiconductor Manufacturing) Edinburgh, UK (19-21 May, 1999); Eds. Chris A. Mack and Tom Stevenson, EUROPTO Series MMT01, SPIE Proc. 3741 pp.: 180-188, (1999)

16. Dirk Richter, Miklos Erdelyi, and Frank K. Tittel: Ultra-compact mid-IR spectroscopic source based on frequency converted Yb - Er/Yb fiber amplified cw diode lasers, 2001 Advanced Solid State Lasers volume in the Trends in Optics and Photopics Series (TOPS) 2001

17. Miklos Erdelyi, Robert F. Curl, and Frank K. Tittel: Portable Diode Laser-Based Sensor for ¹³CO₂/¹²CO₂ Isotopic Ratio Measurement, OSA Meeting 2001 October 14-18, Long Beach CA.

Poster Presentations:

1. Miklos Erdelyi, Zs. Bor, F. K. Tittel, J. R. Cavallaro, G. Szabo, W. L. Wilson, M. C. Smayling and C. Sengupta: "A Phase Shifting Technique For Ultrahigh Resolution Deep-UV Lithography," First International Symposium on 193 nm Lithography, Colorado Springs, CO (Aug. 15-18, 1995).

2. Miklos Erdelyi, Z. L. Horvath, G. Szabo, Zs. Bor, F. K. Tittel, J. R. Cavallaro and M. C. Smayling: "Application of Nondiffracting Bessel Beams to Optical Lithography," Second International Symposium on 193 nm Lithography, Colorado Springs CO (July 30-Aug 2, 1996).

3. Zs. Bor, Miklos Erdelyi, Z. L. Horvath, G. Szabo, F. K. Tittel and J. R. Cavallaro: Enhancement of Depth of Focus Using Nearly Nondiffracting Bessel Beams in Optical Microlithography, "New Nanostructures below 100 nm: Perspectives & Applications", Bad Honnef, Germany (January 27-30, 1997).

4. Bor. Zs., Erdelyi Miklos, Horvath L. Z., Szabo G. es F. K. Tittel: Nemdiffraktalo Bessel Nyalabok Mikrolitografiai Alkalmazasa, Kvantumelektronika '97, Budapest 1997 oktober

5. Erdelyi M, Bor Zs., Szabo G. es F. K. Tittel: Feloldokepesseg novele Annularis Apertura es Coated Objektiv Segitsegevel, Kvantumelektronika '97, Budapest 1997 oktober

6. A. Kroyan, M. Erdelyi, W. L. Wilson, M. C. Smayling, and F. K. Tittel: Wavefront engineering issues related to Deep-UV lithography, Corporate Affiliates Day '97, Rice University

7. Armen Kroyan, Miklos Erdelyi, William L. Wilson, Mike C. Smayling, Frank K. Tittel, Computer simulations of coherent multiple imaging technique, OSA Annual Meeting & Exhibit, ILS-XV: 15^th Interdisciplinary Laser Science Conference, Santa Clara, CA, Sept. 26-30, 1999.

8. Zs. Bor, M. Erdelyi, Z. L. Horvath, G. Szabo, K. Osvay, W. L. Wilson and F. K. Tittel Application of Non-Diffracting Beams, 18th Congress of the International Commission for Optics (3749-32)S4A San Francisco, California USA, 2-6 August 1999