| 1.
Photon, electron
and thermal activation of chemical reactions on metal and semiconductor
|
| 2.
Formation, stability and reactivity of adsorbed species and intermediates formed in catalytic reactions on metal, oxide and nanoparticles
|
| 3.
Application and development of electron spectroscopic methodes (XPS, UPS, AES, HREELS, LEIS) and reflection absorption spectroscopy (RAIRS) in catalysis and surface chemistry
|